Adsorption of 3He on Cesium

D. Ross, J. A. Phillips, J. E. Rutledge and P. Taborek
J. Low Temp. Phys., 106, 81(1997)



Abstract

Introduction

Experiment

Results

Discussion

References





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Introduction

The manner in which a liquid film grows on a surface as bulk coexistence is approached is determined by the binding strength of the surface. On a strongly binding substrate the attractive surface potential serves to stabilize the liquid phase so that wetting films grow smoothly and continuously as bulk coexistence is approached. In contrast, on a weakly binding substrate the free energy balance is more subtle, and the growth may proceed through a first order film thickness transition known as prewetting [1,2]. The locus of prewetting transitions in the P - T (or m - T) plane is the prewetting line. The prewetting line typically intersects the bulk coexistence line at a first order wetting transition and extends upwards in temperature where it ends at a prewetting critical point. The first example of a prewetting phase diagram was found in studies of the adsorption of 4He on cesium [3], and the phenomena has subsequently been observed in a number of systems [4,5,6].
Since the liquid-vapor surface tension of 3He is much smaller than that of 4He, 3He is expected to wet cesium down to zero temperature [7]. Despite the fact that there is no wetting transition in the 3He/Cs system, theoretical predictions indicate that wetting should occur via a prewetting transition [7]. In this case the prewetting line would not intersect the bulk coexistence line but would instead terminate at zero temperature at a chemical potential below coexistence. The theory of Ref[7] also suggests that the Fermi statistics of the 3He should play an important role in the prewetting behavior, and should result in a series of smaller film thickness transitions in addition to a prewetting transition.
Previous work in this laboratory [8] studied the adsorption of 3He on Cs at 1.2 K. One of the conclusions of the previous study was that if prewetting occurs in this system, the prewetting critical point temperature lies well below 1 K. The purpose of the work reported here is to extend these measurements to as low a temperature as possible and to reexamine the question of prewetting. We were able to obtain adsorption isotherm measurements of 3He on Cs down to 0.2 K. Below this temperature the equilibrium time for the experiment became prohibitively long. As expected 3He wets cesium at all temperatures. Additionally, the 3He films thicken at a broadened step in the isotherms located at a chemical potential about 0.6 K below saturation. As the temperature is lowered the steps become steeper until 0.6 K where the steepness of steps becomes constant. This general behavior of the steps is reminiscent of the 4He prewetting line. However, the steps at their sharpest remain ~20 times wider for 3He than for 4He prewetting steps on the same substrates and by naive comparison do not look like first order transitions. In order to decide whether first order prewetting does occur in the 3He/Cs system, one must reconcile these two apparently conflicting observations. Our attempts to do so are discussed below.